Structural Formula

Product DescriptionPhosphonic acid derivatives are used for surface modification on oxidized metals such as Al₂O₃¹⁾, TiO₂²⁾, ZrO₂³⁾, SiO₂⁴⁾, Mica⁵⁾, stainless(SS316L) ⁶⁾, nitinol⁷⁾, hydroxyapatite⁸⁾, AgO⁹⁾, ZnO¹⁰⁾, ITO^11,12).For a long time, organosilanes have been used to form self assembled monolayer (SAM) on the metal oxide. However, it is not always adaptable in the applications due to the poor stability and polymerization of the reagent with each other. On the other hand, phosphonic acid derivatives equally form a SAM on the metal oxide despite being very stable compounds. Also, phosphonic acid derivatives have been reported to use formation of more stable and dense SAM than organosilanes. Klauk et. al. and Sekitani et. al. show alkyl phosphonate SAM on Al₂O₃ is more useful than the trichlorosilane derivatives SAM as an conductor film of an organic transistor¹³⁾.Sharma et. al. have reported the work function of ITO substrate increases by the oxygen plasma treatment or modifying ITO substrate with phosphonic acid (FOPA) containing perfluoroalkyl group. However, the increased level of work function maintains with FOPA modified substrate for 246 hours, while the work function immediately decreases with the substrate treated by oxygen plasma¹¹⁾. In addition, the organic thin-film solar cell fabricated using the modified TO with FOPA increase the stability of light intensity, the driving voltage, and life time.There are three perfluoro based phosphonic acids available with different alkyl lengths.

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